Resist: Difference between revisions
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== Resist == | |||
<gallery> | |||
File:Percival_David_Collection_DSCF3122_17.jpg|Percival David Collection DSCF3122 17 | |||
File:Kosode_(Running_waters_and_wheels_with_mallets).Detail._Matsuzakaya_Collection.jpg|Kosode (Running waters and wheels with mallets) Detail Matsuzakaya Collection | |||
File:Buddhist_Priest's_Mantle_(Kesa)_LACMA_M.2006.46_(16_of_18).jpg|Buddhist Priest's Mantle (Kesa) LACMA M.2006.46 (16 of 18) | |||
File:Batik-encerat2.jpg|Batik encerat2 | |||
File:Tea_Bowl_(Chawan)_with_Leaf_LACMA_58.49.5_(2_of_2).jpg|Tea Bowl (Chawan) with Leaf LACMA 58.49.5 (2 of 2) | |||
File:Al_photoresist_pattern_developed_via_Nomarski_DIC.jpg|Al photoresist pattern developed via Nomarski DIC | |||
</gallery> | |||
Latest revision as of 21:16, 23 February 2025
Resist is a term used in multiple fields, including chemistry, microfabrication, and art. In each of these fields, the term has a unique meaning, but generally refers to a substance or technique used to protect a certain area from an unwanted process.
Chemistry[edit]
In chemistry, a resist is a substance used to protect a part of a surface during a process, such as etching. The resist can be applied to the surface in a pattern, allowing only certain parts of the surface to be affected by the process. This technique is often used in the creation of printed circuit boards.
Microfabrication[edit]
In microfabrication, a resist is a thin layer used to transfer a circuit pattern to the substrate. This is done using a process called photolithography, where the resist is exposed to UV light. The exposed areas of the resist become soluble and can be washed away, leaving behind the desired pattern.
Art[edit]
In art, a resist is a substance applied to a surface to prevent the absorption of paint or dye. This technique is often used in batik, a method of dyeing fabric, and in watercolor painting to create highlights and textures.
See also[edit]
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Resist[edit]
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Percival David Collection DSCF3122 17
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Kosode (Running waters and wheels with mallets) Detail Matsuzakaya Collection
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Buddhist Priest's Mantle (Kesa) LACMA M.2006.46 (16 of 18)
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Batik encerat2
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Tea Bowl (Chawan) with Leaf LACMA 58.49.5 (2 of 2)
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Al photoresist pattern developed via Nomarski DIC



