Triethoxysilane

Chemical compound

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Triethoxysilane is an organosilicon compound with the formula SiH(C_H_O)_. It is a colorless liquid that is used as a precursor to other organosilicon compounds.

Structure and properties

Triethoxysilane is a trialkoxysilane, meaning it contains three ethoxy groups attached to a silicon atom. The silicon atom is also bonded to a hydrogen atom, making it a silyl hydride. The presence of the ethoxy groups makes triethoxysilane a versatile compound in sol-gel processes and as a crosslinking agent.

Synthesis

Triethoxysilane can be synthesized by the reaction of silicon tetrachloride with ethanol in the presence of a base. The reaction proceeds via the formation of ethoxysilicon intermediates, which are then reduced to triethoxysilane.

Applications

Triethoxysilane is used in the production of silicon dioxide films and coatings. It is also employed in the synthesis of silicon carbide and other ceramic materials. In the semiconductor industry, triethoxysilane is used as a precursor for chemical vapor deposition (CVD) processes.

Safety

Triethoxysilane is flammable and should be handled with care. It can react with water to produce ethanol and silicic acid, which can be hazardous. Proper personal protective equipment (PPE) should be used when handling this compound.

Related pages

• Organosilicon chemistry
• Silane
• Silicon dioxide