Triethoxysilane: Difference between revisions

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'''Triethoxysilane''' is a [[chemical compound]] with the formula Si(OC2H5)3. It is a colorless liquid that is used in various [[chemical synthesis|synthetic]] applications and in the production of [[silicon]]-based materials.
{{Short description|Chemical compound}}
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== Structure and Properties ==
'''Triethoxysilane''' is an organosilicon compound with the formula '''SiH(C_H_O)_'''. It is a colorless liquid that is used as a precursor to other organosilicon compounds.


Triethoxysilane is a [[silane]] derivative, which means it contains a silicon atom bonded to three [[ethoxy]] groups and one hydrogen atom. The silicon atom is at the center of the molecule, with the ethoxy groups and the hydrogen atom arranged around it in a tetrahedral geometry.
==Structure and properties==
Triethoxysilane is a trialkoxysilane, meaning it contains three ethoxy groups attached to a silicon atom. The silicon atom is also bonded to a hydrogen atom, making it a [[silyl hydride]]. The presence of the ethoxy groups makes triethoxysilane a versatile compound in [[sol-gel]] processes and as a [[crosslinking]] agent.


The molecule has a molar mass of 178.28 g/mol and a density of 0.93 g/cm3. It is soluble in most organic solvents but is hydrolytic, meaning it reacts with water to form [[ethanol]] and [[silicic acid]].
==Synthesis==
Triethoxysilane can be synthesized by the reaction of [[silicon tetrachloride]] with [[ethanol]] in the presence of a base. The reaction proceeds via the formation of [[ethoxysilicon]] intermediates, which are then reduced to triethoxysilane.


== Synthesis ==
==Applications==
Triethoxysilane is used in the production of [[silicon dioxide]] films and coatings. It is also employed in the synthesis of [[silicon carbide]] and other [[ceramic]] materials. In the [[semiconductor]] industry, triethoxysilane is used as a precursor for [[chemical vapor deposition]] (CVD) processes.


Triethoxysilane can be synthesized by the reaction of [[silicon tetrachloride]] with ethanol in the presence of a base such as [[ammonia]]. The reaction proceeds via a [[nucleophilic substitution]] mechanism, with the ethanol molecules attacking the silicon atom and displacing the chloride ions.
==Safety==
Triethoxysilane is flammable and should be handled with care. It can react with water to produce [[ethanol]] and [[silicic acid]], which can be hazardous. Proper [[personal protective equipment]] (PPE) should be used when handling this compound.


== Applications ==
==Related pages==
 
* [[Organosilicon chemistry]]
Triethoxysilane is used as a precursor in the synthesis of silicon-based materials, including [[silicones]] and [[silica]]-based [[catalyst]]s. It is also used in the production of [[silane coupling agent]]s, which are used to improve the adhesion between inorganic and organic materials in a variety of applications, including [[adhesive]]s, [[coating]]s, and [[composite material]]s.
* [[Silane]]
 
* [[Silicon dioxide]]
== Safety ==


Like other silanes, triethoxysilane is flammable and can react violently with strong oxidizing agents. It is also corrosive and can cause burns and eye damage. Therefore, it should be handled with care, using appropriate [[personal protective equipment]].
==References==
{{Reflist}}


== See Also ==
* [[Silane]]
* [[Silicon tetrachloride]]
* [[Ethanol]]
* [[Silicic acid]]
[[Category:Chemical compounds]]
[[Category:Silanes]]
[[Category:Organosilicon compounds]]
[[Category:Organosilicon compounds]]
 
[[Category:Silicon hydrides]]
{{Chem-stub}}
[[Category:Trialkoxysilanes]]
{{medicine-stub}}

Revision as of 11:58, 9 February 2025

Chemical compound


Chemical Compound
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Triethoxysilane is an organosilicon compound with the formula SiH(C_H_O)_. It is a colorless liquid that is used as a precursor to other organosilicon compounds.

Structure and properties

Triethoxysilane is a trialkoxysilane, meaning it contains three ethoxy groups attached to a silicon atom. The silicon atom is also bonded to a hydrogen atom, making it a silyl hydride. The presence of the ethoxy groups makes triethoxysilane a versatile compound in sol-gel processes and as a crosslinking agent.

Synthesis

Triethoxysilane can be synthesized by the reaction of silicon tetrachloride with ethanol in the presence of a base. The reaction proceeds via the formation of ethoxysilicon intermediates, which are then reduced to triethoxysilane.

Applications

Triethoxysilane is used in the production of silicon dioxide films and coatings. It is also employed in the synthesis of silicon carbide and other ceramic materials. In the semiconductor industry, triethoxysilane is used as a precursor for chemical vapor deposition (CVD) processes.

Safety

Triethoxysilane is flammable and should be handled with care. It can react with water to produce ethanol and silicic acid, which can be hazardous. Proper personal protective equipment (PPE) should be used when handling this compound.

Related pages

References

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