Triethoxysilane: Difference between revisions

Latest revision as of 11:07, 15 February 2025

Triethoxysilane[edit]

Triethoxysilane is an organosilicon compound with the chemical formula SiH(C_H_O)_. It is a colorless liquid that is used as a precursor to other organosilicon compounds. Triethoxysilane is notable for its role in the production of silicon dioxide films and coatings, as well as its use in the synthesis of silane coupling agents.

Chemical Properties[edit]

Triethoxysilane is characterized by the presence of a silicon atom bonded to three ethoxy groups and one hydrogen atom. This structure allows it to undergo hydrolysis and condensation reactions, which are fundamental to its applications in forming siloxane bonds. The hydrolysis of triethoxysilane can be represented by the following reaction:

SiH(C_H_O)_ + 3 H_O _ Si(OH)_ + 3 C_H_OH

The resulting silicic acid can further condense to form silica networks.

Applications[edit]

Triethoxysilane is primarily used in the production of silicon dioxide films through processes such as chemical vapor deposition (CVD). These films are essential in the semiconductor industry for the fabrication of integrated circuits.

Additionally, triethoxysilane serves as a precursor in the synthesis of silane coupling agents, which are used to improve the adhesion between inorganic materials and organic polymers. This is particularly important in the production of composite materials and adhesives.

Safety and Handling[edit]

Triethoxysilane is a flammable liquid and should be handled with care. It can react with water to release ethanol and form siloxane bonds, which may lead to the formation of gels or precipitates. Proper storage and handling procedures should be followed to prevent accidental exposure or reactions.

Related Pages[edit]

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-'''Triethoxysilane''' is a [[chemical compound]] with the formula Si(OC2H5)3. It is a colorless liquid that is used in various [[chemical synthesis|synthetic]] applications and in the production of [[silicon]]-based materials.
+== Triethoxysilane ==
-== Structure and Properties ==
+[[File:Triethoxysilane.svg|thumb|right|Structural formula of Triethoxysilane]]
-Triethoxysilane is a [[silane]] derivative, which means it contains a silicon atom bonded to three [[ethoxy]] groups and one hydrogen atom. The silicon atom is at the center of the molecule, with the ethoxy groups and the hydrogen atom arranged around it in a tetrahedral geometry.
+'''Triethoxysilane''' is an organosilicon compound with the chemical formula SiH(C_H_O)_. It is a colorless liquid that is used as a precursor to other [[organosilicon]] compounds. Triethoxysilane is notable for its role in the production of [[silicon dioxide]] films and coatings, as well as its use in the synthesis of [[silane]] coupling agents.
-The molecule has a molar mass of 178.28 g/mol and a density of 0.93 g/cm3. It is soluble in most organic solvents but is hydrolytic, meaning it reacts with water to form [[ethanol]] and [[silicic acid]].
+== Chemical Properties ==
-== Synthesis ==
+Triethoxysilane is characterized by the presence of a silicon atom bonded to three ethoxy groups and one hydrogen atom. This structure allows it to undergo hydrolysis and condensation reactions, which are fundamental to its applications in forming siloxane bonds. The hydrolysis of triethoxysilane can be represented by the following reaction:
-Triethoxysilane can be synthesized by the reaction of [[silicon tetrachloride]] with ethanol in the presence of a base such as [[ammonia]]. The reaction proceeds via a [[nucleophilic substitution]] mechanism, with the ethanol molecules attacking the silicon atom and displacing the chloride ions.
+: SiH(C_H_O)_ + 3 H_O _ Si(OH)_ + 3 C_H_OH
+The resulting [[silicic acid]] can further condense to form [[silica]] networks.
 == Applications ==
-Triethoxysilane is used as a precursor in the synthesis of silicon-based materials, including [[silicones]] and [[silica]]-based [[catalyst]]s. It is also used in the production of [[silane coupling agent]]s, which are used to improve the adhesion between inorganic and organic materials in a variety of applications, including [[adhesive]]s, [[coating]]s, and [[composite material]]s.
+Triethoxysilane is primarily used in the production of [[silicon dioxide]] films through processes such as chemical vapor deposition (CVD). These films are essential in the [[semiconductor]] industry for the fabrication of [[integrated circuits]].
-== Safety ==
+Additionally, triethoxysilane serves as a precursor in the synthesis of silane coupling agents, which are used to improve the adhesion between inorganic materials and organic polymers. This is particularly important in the production of [[composite materials]] and [[adhesives]].
-Like other silanes, triethoxysilane is flammable and can react violently with strong oxidizing agents. It is also corrosive and can cause burns and eye damage. Therefore, it should be handled with care, using appropriate [[personal protective equipment]].
+== Safety and Handling ==
-== See Also ==
+Triethoxysilane is a flammable liquid and should be handled with care. It can react with water to release ethanol and form siloxane bonds, which may lead to the formation of gels or precipitates. Proper storage and handling procedures should be followed to prevent accidental exposure or reactions.
+== Related Pages ==
+* [[Organosilicon chemistry]]
 * [[Silane]]
-* [[Silicon tetrachloride]]
+* [[Silicon dioxide]]
-* [[Ethanol]]
+* [[Chemical vapor deposition]]
-* [[Silicic acid]]
+[[Category:Organosilicon compounds]]
 [[Category:Chemical compounds]]
-[[Category:Silanes]]
-[[Category:Organosilicon compounds]]
-{{Chem-stub}}
-{{medicine-stub}}